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Dong Won Koo

from Sunnyvale, CA
Age ~52

Dong Koo Phones & Addresses

  • 1071 Konstanz Ter, Sunnyvale, CA 94089 (408) 394-9288
  • 718 Old San Francisco Rd, Sunnyvale, CA 94086
  • 1341 Jonathan St, Santa Clara, CA 95050
  • 4194 Hamilton Ave, San Jose, CA 95130
  • Ithaca, NY
  • 1208 Farrell Ter, Rahway, NJ 07065
  • New York, NY

Resumes

Resumes

Dong Koo Photo 1

Dong Koo

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Location:
1071 Konstanz Ter, Sunnyvale, CA 94089
Industry:
Telecommunications
Work:
Juniper Networks
Supply Chain Management
Skills:
Competitive Analysis
Consumer Electronics
Wireless
Supply Chain Management
Supply Chain
Semiconductors
Semiconductor Industry
Program Management
Product Marketing
Pricing
Product Management
Management
Go To Market Strategy
Cross Functional Team Leadership
Languages:
English
Dong Koo Photo 2

Dong Koo

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Dong Koo Photo 3

Dong Koo

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Publications

Us Patents

Hat

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US Patent:
7185371, Mar 6, 2007
Filed:
Nov 14, 2005
Appl. No.:
11/273612
Inventors:
Dong Keun Koo - Fort Lee NJ, US
International Classification:
A42B 1/24
US Classification:
220913, 2 10
Abstract:
Disclosed is a hat with a shade panel that is constructed so as to achieve optimal optical efficiency. The shade panel is adapted to be attached to the crown of the hat via a flexible connecting member. The shade panel is moveable between a retracted position, in which the shade panel is positioned inside a cavity of the hat, and an extended position, in which the shade panel is positioned outside of the cavity of the hat, orienting the shade panel substantially vertically and in close proximity to a wearer's face.

Hat With Shade Panel

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US Patent:
20050132461, Jun 23, 2005
Filed:
May 18, 2004
Appl. No.:
10/848284
Inventors:
Dong Koo - Fort Lee NJ, US
International Classification:
A61F009/00
US Classification:
002012000, 002209130
Abstract:
Disclosed is a hat with a shade panel that is constructed in a simple manner, is convenient to use, is made at a substantially low cost, and has the shade panel placed at a substantially close distance to wearer's eyes to allow him to clearly view surrounding objects. The shade panel is adapted to be mounted on an inner periphery of a rim of the hat that comes in contact with a wearer's forehead, in such a manner as to be foldable by means of folding means.

Method For Improved Cleaning Of Substrate Processing Systems

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US Patent:
61258598, Oct 3, 2000
Filed:
Jul 11, 1997
Appl. No.:
8/893922
Inventors:
Karl Anthony Littau - Palo Alto CA
Anand Vasudev - San Jose CA
Dong Won Koo - Rahway NJ
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
H01L 2100
US Classification:
134 11
Abstract:
A method for a multiple-stage microwave plasma cleaning technique for efficiently cleaning a substrate processing chamber. In a specific embodiment, a two-stage cleaning process is described. The first stage begins by flowing a reactive gas from a gas source into a processing chamber where microwaves ignite and maintain a plasma from the reactive gas. Reactive radicals generated which react with residues on the interior surfaces of the processing chamber. In the second stage, an inert gas is flowed into the processing chamber in addition to the reactive gas. Microwaves then ignite and maintain a plasma from the reactive gas and optionally, the inert gas as well. Optionally, an inert gas can be flowed into the processing chamber prior to the first stage to remove loose particles from the processing chamber. The reactive gas in such embodiments is preferably NF. sub. 3, but other fluorine-containing gases such as carbon tetrafluoride (CF. sub.
Dong Won Koo from Sunnyvale, CA, age ~52 Get Report