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Samuel P Kounaves

from Winchester, MA
Age ~75
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Also known as:
Sam P Kounaves, Saml Kounaves
Phone and address:
45 Sargent Rd, Winchester, MA 01890
(781) 729-2017
Related to:
Harriet Kounaves, 73
Connected to:
Michael E Kounavis, 50Holli Kounce, 50Catherine Koundakjian, 55Theodore H Koundakjian, 89David J Kounelis, 36Gregoria Kounelis, 55Julia C Kouneski, 38Penka D Kouneva, 57George A Kounis, 57Mark T Kounkel, 57

Samuel Kounaves Phones & Addresses

  • 45 Sargent Rd, Winchester, MA 01890 (781) 729-2017 (781) 521-5908
  • Medford, MA
  • Snyder, NY
  • San Diego, CA
  • 45 Sargent Rd, Winchester, MA 01890

Work

Company: Technical university berlin May 2014 Position: Consulting scientist

Education

School / High School: Harvard University 1987 to 1988 Specialities: Chemistry

Skills

Professor • Planetary Science • Geochemistry • Analytical Chemistry • Electroanalytical

Industries

Higher Education

Resumes

Resumes

Samuel Kounaves Photo 1

Professor

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Location:
45 Sargent Rd, Winchester, MA 01890
Industry:
Higher Education
Work:
Technical University Berlin
Consulting Scientist
Imperial College London
Visiting Professor
Tufts University
Adjunct Professor
Jet Lab
Affiliate Scientist
Tufts University
Professor
Education:
Harvard University 1987 - 1988
University of Geneva 1979 - 1985
Doctorates, Doctor of Science, Doctor of Philosophy, Chemistry California State University at San Diego 1972 - 1978
Master of Science, Masters, Bachelors, Bachelor of Science, Chemistry
Skills:
Professor
Planetary Science
Geochemistry
Analytical Chemistry
Electroanalytical

Publications

Us Patents

Microfabricated Array Of Iridium Microdisks

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US Patent:
6527930, Mar 4, 2003
Filed:
Jun 21, 2000
Appl. No.:
09/598115
Inventors:
Samuel P. Kounaves - Winchester MA
Melissa A. Nolan - Henderson NV
Assignee:
Trustees of Tufts College - Medford MA
International Classification:
G01N 2742
US Classification:
204434, 204412, 204413
Abstract:
An ultramicroelectrode is disclosed which includes a) a silicon substrate; b) a silicon oxide insulating layer; c) a titanium adhesion layer; d) an iridium layer; e) a gold bond pad layer; f) a titanium adhesion layer; and g) a silicon dioxide insulating layer. In a preferred embodiment, the f) and g) layers have been partially or totally removed. Preferably, the ultramicroelectrode of the invention does not include mercury.

Total Organic Carbon (Toc) Analyzer

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US Patent:
7632393, Dec 15, 2009
Filed:
Jun 10, 2003
Appl. No.:
10/517584
Inventors:
Samuel P. Kounaves - Winchester MA, US
Assignee:
Trustees of Tufts College - Medford MA
International Classification:
G01N 27/403
US Classification:
2057855, 204424
Abstract:
The invention disclosed is a total organic carbon (TOC) analyzer comprised of an electrochemical cell comprising a diamond-film electrode () doped with boron or other conductivity including material. The diamond-film electrode is the working electrode and carries out the oxidation of TOC to produce carbon dioxide. The apparatus further comprises sensors for detecting the carbon dioxide produced. Such sensors include but are not limited to a tunable diode laser () and/or ion-selective electrode (). The invention also discloses a method for measuring TOC in an aqueous solution using a total organic carbon analyzer.

Total Organic Compound (Toc) Analyzer

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US Patent:
8216447, Jul 10, 2012
Filed:
Dec 14, 2009
Appl. No.:
12/637393
Inventors:
Samuel P. Kounaves - Winchester MA, US
Assignee:
O.I. Corporation - College Station TX
International Classification:
G01N 27/403
US Classification:
205787, 205783, 204424
Abstract:
The invention disclosed is a total organic carbon (TOC) analyzer comprised of an electrochemical cell comprising a diamond-film electrode doped with boron or other conductivity inducing material. The diamond-film electrode is the working electrode and carries out the oxidation of TOC to produce carbon dioxide. The apparatus further comprises sensors for detecting the carbon dioxide produced. Such sensors include but are not limited to a tunable diode laser and/or ion-selective electrode. The invention also discloses a method for measuring TOC in an aqueous solution using a total organic carbon analyzer.

Metal, Metal Alloy, And Metal Oxide Formation By Electrodeposition Of Polymetalllic Complexes

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US Patent:
52777898, Jan 11, 1994
Filed:
Jun 29, 1992
Appl. No.:
7/905566
Inventors:
Samuel P. Kounaves - Winchester MA
Albert Robbat - Andover MA
Geoffrey Davies - Lexington MA
Assignee:
Tufts University - Medford MA
Northeastern University - Boston MA
International Classification:
C25D 356
US Classification:
205238
Abstract:
A novel method for making metals and homogeneous metal alloys comprises the steps of (a) providing a polymetallic complex of the general formula (. mu. sub. 4 -0)L. sub. 4 M'M"M'"M""X. sub. n wherein L is a ligand selected from the group consisting of organic and inorganic ligands, wherein M', M", M'", and M"" are metal atoms two or more of which may be the same, wherein X is a halogen atom, and wherein n is an integer ranging from 4 to 6; and (b) electrochemically depositing at least one of the metals from said polymetallic complex.

Electrode Assembly Including Iridium Based Mercury Ultramicroelectrode Array

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US Patent:
53783433, Jan 3, 1995
Filed:
Jan 11, 1993
Appl. No.:
8/003229
Inventors:
Samuel P. Kounaves - Winchester MA
Gregory T. A. Kovacs - Stanford CA
Christopher W. Storment - Cupertino CA
Assignee:
Tufts University - Medford MA
Leland Standard Univ. - Stamford CA
International Classification:
G01N 2726
US Classification:
204413
Abstract:
An electrode assembly for use in quantifying the levels of various metals in an aqueous solution. In one embodiment, the electrode assembly comprises a substrate, the substrate being a silicon chip upon which a layer of silicon dioxide has been grown. A plurality of gold bond pads and gold interconnect traces are deposited by microphotolithography onto the silicon dioxide layer. An array of iridium deposits are then patterned by microphotolithography onto the interconnect traces at predefined locations. A passivation layer is deposited by plasma enhanced chemical vapor deposition over the finished metallization to electrically insulate it from external solutions. Plasma etching is then used to expose at least a portion of each of the iridium deposits. Just prior to analytical use, one or more of the exposed iridium elements are electroplated with mercury. The present invention is also directed to a field deployable sensor including the above-described electrode assembly.
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Samuel P Kounaves from Winchester, MA, age ~75 Get Report